TW288155B - - Google Patents

Info

Publication number
TW288155B
TW288155B TW080109509A TW80109509A TW288155B TW 288155 B TW288155 B TW 288155B TW 080109509 A TW080109509 A TW 080109509A TW 80109509 A TW80109509 A TW 80109509A TW 288155 B TW288155 B TW 288155B
Authority
TW
Taiwan
Application number
TW080109509A
Other languages
Chinese (zh)
Original Assignee
At & T Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by At & T Corp filed Critical At & T Corp
Application granted granted Critical
Publication of TW288155B publication Critical patent/TW288155B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/02Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/002Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/14Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method characterised by the seed, e.g. its crystallographic orientation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/901Levitation, reduced gravity, microgravity, space
    • Y10S117/902Specified orientation, shape, crystallography, or size of seed or substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
TW080109509A 1991-01-28 1991-12-03 TW288155B (en])

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/646,125 US5123996A (en) 1991-01-28 1991-01-28 Crystal growth method and apparatus

Publications (1)

Publication Number Publication Date
TW288155B true TW288155B (en]) 1996-10-11

Family

ID=24591858

Family Applications (1)

Application Number Title Priority Date Filing Date
TW080109509A TW288155B (en]) 1991-01-28 1991-12-03

Country Status (7)

Country Link
US (1) US5123996A (en])
EP (1) EP0497482B1 (en])
JP (1) JPH04362084A (en])
KR (1) KR100190771B1 (en])
DE (1) DE69203737T2 (en])
HK (1) HK78196A (en])
TW (1) TW288155B (en])

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0992618B1 (en) * 1998-03-31 2007-01-03 Nippon Mining & Metals Co., Ltd. Method of manufacturing compound semiconductor single crystal
WO2011050170A2 (en) * 2009-10-22 2011-04-28 Advanced Renewable Energy Company Llc Crystal growth methods and systems
KR101198163B1 (ko) 2011-01-26 2012-11-12 디케이아즈텍 주식회사 타원형 도가니를 이용한 카이로플러스법에 의한 사파이어 단결정 제조 장치
JP2012212851A (ja) 2011-03-18 2012-11-01 Ricoh Co Ltd プリント基板、画像形成装置及びプリント基板の再利用回数の認識方法
JP7155968B2 (ja) * 2018-12-04 2022-10-19 Tdk株式会社 単結晶育成用ルツボ及び単結晶製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2116916A5 (fr) * 1970-12-11 1972-07-21 Radiotechnique Compelec Procede de fabrication de monocristaux de composes semiconducteurs
FR2175594B1 (en]) * 1972-03-15 1974-09-13 Radiotechnique Compelec
US3944393A (en) * 1973-11-21 1976-03-16 Monsanto Company Apparatus for horizontal production of single crystal structure
US4404172A (en) * 1981-01-05 1983-09-13 Western Electric Company, Inc. Method and apparatus for forming and growing a single crystal of a semiconductor compound
US4343662A (en) * 1981-03-31 1982-08-10 Atlantic Richfield Company Manufacturing semiconductor wafer devices by simultaneous slicing and etching
US4714101A (en) * 1981-04-02 1987-12-22 United Technologies Corporation Method and apparatus for epitaxial solidification
JPS6221786A (ja) * 1985-07-18 1987-01-30 Hitachi Cable Ltd 横型ボ−ト法による3−v族化合物半導体単結晶製造装置のボ−ト及びこれに収容される種結晶
JPS63182288A (ja) * 1987-01-22 1988-07-27 Mitsubishi Metal Corp 3−5族化合物単結晶の製造方法
JP2723249B2 (ja) * 1988-04-28 1998-03-09 日本電信電話株式会社 結晶育成方法および結晶育成用るつぼ
US4946542A (en) * 1988-12-05 1990-08-07 At&T Bell Laboratories Crystal growth method in crucible with step portion
US4966645A (en) * 1989-12-04 1990-10-30 At&T Bell Laboratories Crystal growth method and apparatus

Also Published As

Publication number Publication date
EP0497482B1 (en) 1995-08-02
DE69203737D1 (de) 1995-09-07
KR100190771B1 (ko) 1999-06-01
EP0497482A1 (en) 1992-08-05
US5123996A (en) 1992-06-23
DE69203737T2 (de) 1996-04-04
HK78196A (en) 1996-05-10
KR920014956A (ko) 1992-08-26
JPH04362084A (ja) 1992-12-15

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